Semiconductor device simulation method, semiconductor device simulator, computer program for semiconductor device simulation, and method of manufacturing the semiconductor device

摘要

A simulation method simulates a self-aligned silicide (SALICIDE) process according to heat treatment temperatures and changes in the composition of a silicide film during first and second heat treatments. The simulation method separately simulates silicide reactions in the first and second heat treatments according to species (metal or silicon) diffusing through a silicide, to thereby improve the accuracy of simulations.