发明名称 |
Hard carbon film and surface-acoustic-wave substrate |
摘要 |
The invention offers a hard carbon film and a SAW substrate that are easy to fabricate or low in manufacturing cost while virtually maintaining the quality that affects the important properties of a device that comprises the hard carbon film or the SAW substrate. The hard carbon film comprises a composite film of graphite-like diamond and carbon clusters; the composite film has a continuous crystal structure.
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申请公布号 |
US2001030795(A1) |
申请公布日期 |
2001.10.18 |
申请号 |
US20000739210 |
申请日期 |
2000.12.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
FUJII SATOSHI;UEMURA TOMOKI;SEKI YUICHIRO;NAKAHATA HIDEAKI;SHIKATA SHINICHI |
分类号 |
C01B31/00;C23C16/26;H03H3/08;H03H9/02;(IPC1-7):G02F1/11 |
主分类号 |
C01B31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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