| 摘要 |
<p>A sputtering target for use in forming a protective film for an optical disk, characterized as comprising a sintered compact comprising, as a main component, at least one ceramic powder selected from among an oxide, nitride, carbide, boride, sulfide and silicide being coated with or mixed with a metal or an alloy. The sputtering target is characteristic in using an improved material allowing DC sputtering, which leads to the improvement of the uniformity of a formed film and to the enhancement of production efficiency.</p> |
