| 发明名称 |
Polishing pad with a transparent portion |
| 摘要 |
A transparent portion of a polishing pad in the solid phase has an index of refraction nearly matched to the index of refraction of a fluid polishing composition for chemical mechanical polishing, which minimizes scattering of an optical beam at an interface of the transparent portion and the polishing composition.
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| 申请公布号 |
US2001031610(A1) |
申请公布日期 |
2001.10.18 |
| 申请号 |
US20010792813 |
申请日期 |
2001.02.24 |
| 申请人 |
BUDINGER WILLIAM D.;ROBERTS JOHN V. H. |
发明人 |
BUDINGER WILLIAM D.;ROBERTS JOHN V. H. |
| 分类号 |
B24B37/00;B24B37/04;B24B37/20;B24B37/26;B24B49/12;B24D13/14;C09G1/02;H01L21/304;(IPC1-7):B24B1/00;B24B7/20 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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