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发明名称
A METHOD OF FORMING DUAL GATE OXIDE LAYERS OF VARYING THICKNESS ON A SINGLE SUBSTRATE
摘要
申请公布号
EP1145307(A1)
申请公布日期
2001.10.17
申请号
EP20000975392
申请日期
2000.10.26
申请人
KONINKLIJKE PHILIPS ELECTRONICS N.V.;PHILIPS SEMICONDUCTORS INC.
发明人
LUTZE, JEFFREY;DE MUIZON, EMMANUEL
分类号
H01L21/76;H01L21/762;H01L21/8234;H01L21/8238;H01L27/088;(IPC1-7):H01L21/823
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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