| 摘要 |
An method is disclosed for on-site preparation of a relief image comprising the following steps: (a) laminating a material comprising, in the order given, a first peelable support (1), an image recording layer (2) and an adhesive layer (3) onto a UV-sensitive material comprising a support (7), an UV-sensitive layer (6) wherein the adhesive layer (3) is laminated to the UV-sensitive layer (6); (b) image-wise exposing the image recording layer (2) to form a mask; (c) flood exposing the UV-sensitive material through the mask; (d) developing the UV-sensitive material; wherein the peelable support (1) is removed either before step (b), (c) or (d). Steps (a) to (d) are performed within a period of less than 2 months. As a result the extent of monomer diffusion from the UV-sensitive layer to the image recording layer is reduced. Additionally the adhesion between the image recording layer and the UV-sensitive material is optimised. Furthermore, almost all conventional imaging materials, that are normally used for contact exposure, can be applied in this method. <IMAGE> |
