发明名称 Hollow form surface pattern structure
摘要 A hollow form body having a first-level faceplate and a second-level faceplate, with an appropriately sized space formed in between the two faceplates and a pattern formed on the one of the faceplates. An arresting edge of an appropriate height extends from the outline of a pattern such that a recessed area is formed in the bottom section of the pattern by the arresting edge. The pattern is figured on the first-level faceplate. A thick section at the lower extent of the arresting edge of the pattern covers and fastens onto the first-level faceplate, with a section being exposed on the surface of the first-level faceplate. The first-level faceplate fits into the recessed area of the pattern unit itself formed by the arresting edge and a rib is formed where the first-level faceplate covers the arresting edge.
申请公布号 US6303198(B1) 申请公布日期 2001.10.16
申请号 US19990394911 申请日期 1999.09.13
申请人 CHEN SHOU-TE 发明人 CHEN SHOU-TE
分类号 B44C1/28;B44C3/02;B44C3/04;B44C5/04;(IPC1-7):B44C1/26;B32B3/02 主分类号 B44C1/28
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