发明名称 MANUFACTURING METHOD OF THIN FILM AND FINE STRUCTURAL BODY AND THIN FILM AND FINE STRUCTURAL BODY
摘要 PROBLEM TO BE SOLVED: To provide a film having a functional solute existing in a state of high dispersion and isotropy equal to or above a liquid state. SOLUTION: A coating liquid containing the solutes 2 and 3 exhibiting the functions is applied on a substrate 3 and is irradiated with an energy beam before a solvent in the coating liquid is evaporated so that the high dispersion and isotropic state is obtained and film is formed. The film having the high dispersion and isotropy is suitably obtained particularly by using an ink discharge method as the coating liquid applying method.
申请公布号 JP2001286818(A) 申请公布日期 2001.10.16
申请号 JP20000105999 申请日期 2000.04.07
申请人 SEIKO EPSON CORP 发明人 MORII KATSUYUKI;SEKI SHUNICHI
分类号 H05B33/10;B05D3/06;B05D7/00;H01L51/50;H05B33/14;(IPC1-7):B05D3/06 主分类号 H05B33/10
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