发明名称 Method and system of managing wafers in a semiconductor device production facility
摘要 A method and a system is provided to automatically manage wafers in a semiconductor device production facility. Wafers to be processed in a clean room are automatically identified, tracked and sorted on a single wafer basis. By means of a wafer attribute information, including the unique position data and the entirety of a specific treatment to which the wafer is subjected, the processing of each wafer is controlled without the necessity to place wafers of respective lots in a single wafer cassette.
申请公布号 US6303398(B1) 申请公布日期 2001.10.16
申请号 US20000564211 申请日期 2000.05.04
申请人 ADVANCED MICRO DEVICES, INC. 发明人 GOERIGK PETER
分类号 G01R31/28;(IPC1-7):G01R31/26 主分类号 G01R31/28
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