发明名称 MICROSTRUCTURE AND ITS MANUFACTURING METHOD, AND ETCHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a microstructure and its manufacturing method, and an etching device capable of manufacturing a microstructure with a smooth inclining surface in a short manufacturing time. SOLUTION: A plurality of thin films 30A having a predetermined two-dimensional pattern are formed on a substrate 1, and an inclining surface 30a inclining to the substrate 1 is formed on a side surface of each of the thin films 30A. The plurality of the thin films 30A are peeled from the substrate 1 and are laminated on a stage 6 to manufacture the microstructure 8 having an inclining part 8a on the stage 6.
申请公布号 JP2001287198(A) 申请公布日期 2001.10.16
申请号 JP20000104427 申请日期 2000.04.06
申请人 FUJI XEROX CO LTD 发明人 YAMADA TAKAYUKI;TAKAHASHI MUTSUYA
分类号 B81B1/00;H01L21/302;H01L21/3065;(IPC1-7):B81B1/00;H01L21/306 主分类号 B81B1/00
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