发明名称 |
MICROSTRUCTURE AND ITS MANUFACTURING METHOD, AND ETCHING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a microstructure and its manufacturing method, and an etching device capable of manufacturing a microstructure with a smooth inclining surface in a short manufacturing time. SOLUTION: A plurality of thin films 30A having a predetermined two-dimensional pattern are formed on a substrate 1, and an inclining surface 30a inclining to the substrate 1 is formed on a side surface of each of the thin films 30A. The plurality of the thin films 30A are peeled from the substrate 1 and are laminated on a stage 6 to manufacture the microstructure 8 having an inclining part 8a on the stage 6.
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申请公布号 |
JP2001287198(A) |
申请公布日期 |
2001.10.16 |
申请号 |
JP20000104427 |
申请日期 |
2000.04.06 |
申请人 |
FUJI XEROX CO LTD |
发明人 |
YAMADA TAKAYUKI;TAKAHASHI MUTSUYA |
分类号 |
B81B1/00;H01L21/302;H01L21/3065;(IPC1-7):B81B1/00;H01L21/306 |
主分类号 |
B81B1/00 |
代理机构 |
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