发明名称 Support system for a radiation treatment apparatus
摘要 A support system for a radiation treatment system includes a rotatable extension arm extending from a vertical shaft and a rotatable counterbalance extending diametrically opposed to the extension arm from the vertical shaft. The vertical shaft is rotatably supported by a support base. The support base may include a damping mechanism to damp the rotational motion of the vertical shaft relative to the support base, wherein the damping force is preferably proportional to the velocity of the vertical shaft. The radiation treatment system is suspended from a cable extending from a distal end of the extension arm. The extension arm can be formed from a first arm extending from the vertical shaft and a second arm rotatably coupled to the first arm in order to permit the radiation treatment system to be moved in horizontal direction. The cable supporting the radiation treatment system can be coupled to a vertical counterbalance weight to allow the vertical position of the radiation treatment system to be adjusted. In addition, mass of the vertical counterbalance weight can be adjusted to compensate for attachments which may be used with the radiation treatment system during treatment. The radiation treatment system can be supported to permit rotation about a horizontal axis that extends through the center of mass of the radiation treatment system. In addition position of the horizontal axis of rotation relative to the center of mass of the radiation treatment system can be adjusted to compensate for attachments which may change the center of mass of the radiation treatment system.
申请公布号 US6302581(B1) 申请公布日期 2001.10.16
申请号 US20000502473 申请日期 2000.02.11
申请人 PHOTOELECTRON CORPORATION 发明人 SLISKI ALAN P.;HARTE KENNETH J.
分类号 A61N5/01;A61N5/10;(IPC1-7):H05G1/02 主分类号 A61N5/01
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