| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a composition for memory hard disk polishing having a high polishing speed and giving an excellent surface with small roughness and no defect and a polishing method using the same. SOLUTION: This polishing composition has a pH of 2-7 and contains (a) 0.1-50 wt.% (based on the composition) at least one abrasive selected from among silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride, and magnesium dioxide, (b) 0.001-10 wt.% (based on the composition) at least one compound selected from among periodic acid, potassium periodate, sodium periodate, and lithium periodate, and (c) water. The polishing method uses the composition.</p> |
