发明名称 ELECTROSTATIC CHUCK DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrostatic chuck device that will not make a crack or a failure in a buffer layer mounted between an electrostatic chuck and a base and has good heat resistance of the buffer layer and to provide its manufacturing method, too. SOLUTION: The buffer layer in order to offset a difference between a lower insulation layer and the base is mounted between them, which is made of an aluminum-based composite material reduced gradually in ceramics content such that its coefficient of thermal expansion gets gradually higher from an insulation layer side to the base side between the lower electrostatic chuck and the base. The composite material is continuously integrated with an aluminum alloy in the composite material and integrated continuously with the base.</p>
申请公布号 JP2001287130(A) 申请公布日期 2001.10.16
申请号 JP20000105808 申请日期 2000.04.07
申请人 TAIHEIYO CEMENT CORP 发明人 TSUTO HIROYUKI;SHIOGAI TATSUYA;TAKEI YOSHIBUMI;HARADA TAMOTSU;AOKI ICHIRO
分类号 B23Q3/15;H01L21/68;H01L21/683;(IPC1-7):B23Q3/15 主分类号 B23Q3/15
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