发明名称 Catoptric reduction projection optical system and exposure apparatus and method using same
摘要 A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.
申请公布号 US6302548(B2) 申请公布日期 2001.10.16
申请号 US20010760891 申请日期 2001.01.17
申请人 NIKON CORPORATION 发明人 TAKAHASHI TOMOWAKI;SUENAGA YUTAKA
分类号 G02B17/06;G03F7/20;(IPC1-7):G02B5/10 主分类号 G02B17/06
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