| 发明名称 |
Rotating film carrier and aperture for precision deposition of sputtered alloy films |
| 摘要 |
A method and system for producing thin film alloy by a sputtering deposition process comprising using a circle-shaped aperture interposed between the target and substrate of a sputtering deposition system and establishing a rotating/oscillating relationship between the substrate and the aperture.
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| 申请公布号 |
US6303008(B1) |
申请公布日期 |
2001.10.16 |
| 申请号 |
US20000667757 |
申请日期 |
2000.09.21 |
| 申请人 |
DELPHI TECHNOLOGIES, INC. |
发明人 |
PICHULO ROBERT O.;RASMUSSEN GREGORY KELLER;MCCLANAHAN MARK RAY |
| 分类号 |
C23C14/04;C23C14/35;C23C14/50;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/04 |
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