CLEANING DEVICE AND METHOD OF PRODUCING COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide a cleaning device capable of removing resist residues without causing change in the sectional form of a pattern and to provide a method of producing a color filter. SOLUTION: The cleaning device 1 is used for removing resist residues on a substrate and has at least an ozone water cleaning means 2 for supplying ozone water capable of substantially lowering adhesiveness of the resist residues, only onto the substrate, a hydrogen water cleaning means 3 for supplying hydrogen water onto the substrate and a substrate conveying means 4 for conveying the substrate to the ozone water cleaning means 2 and the hydrogen water cleaning means 3. A color filter is produced using the cleaning deice 1 mentioned above.