发明名称 |
Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups |
摘要 |
The present invention is directed to a high-performance irradiation sensitive resists and to a polymer resin composition useful for making the same. In accordance to the present invention, the polymer resin comprises a dual blocked polymer resins. Specifically, the dual blocked polymer resin comprises at least two different acid labile protecting groups which block some, but not all, of the polar functional groups of the polymer resin. a chemically amplified resist system comprising said dual blocked polymer resin; at least one acid generator; and a solvent is also provided herein.
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申请公布号 |
US6303263(B1) |
申请公布日期 |
2001.10.16 |
申请号 |
US19980030568 |
申请日期 |
1998.02.25 |
申请人 |
INTERNATIONAL BUSINESS MACHINES MACHINES |
发明人 |
CHEN KUANG-JUNG;DELLAGUARDIA RONALD A.;HUANG WU-SONG;KATNANI AHMAD D.;KHOJASTEH MAHMOUD M.;LIN QINGHUANG |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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