发明名称 COATING LIQUID COMPOSITION, METHOD FOR FORMING THIN FILM AND THIN FILM
摘要 <p>PROBLEM TO BE SOLVED: To provide a coating liquid composition permitting a functional material to form in a thin film a highly dispersed isotropic state closer to a solution state without detriment to its functions in a method for forming a functional thin film, and to provide a thin film-forming method using the same, thin film and a fine structure. SOLUTION: A thin film is formed by a spin coating method or an ink jet method using a coating liquid (ink) composition comprising a functional material dissolved or dispersed in at least two organic solvents comprising a liquid solvent and a solid solvent soluble in the liquid solvent.</p>
申请公布号 JP2001288416(A) 申请公布日期 2001.10.16
申请号 JP20000105995 申请日期 2000.04.07
申请人 SEIKO EPSON CORP 发明人 SEKI SHUNICHI;MORII KATSUYUKI
分类号 H05B33/10;C09D5/22;C09D11/00;C09D201/00;H01L51/50;H05B33/12;H05B33/14;(IPC1-7):C09D201/00 主分类号 H05B33/10
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