发明名称 |
Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam |
摘要 |
A secondary charged particle image acquisition method and its apparatus for detecting a secondary charged particle image. The method includes the steps of irradiating a surface of a specimen with a focused charged particle beam and detecting a secondary charged particle emanated from the surface of the specimen, obtaining a secondary charged particle image based on the detected secondary charged particle, irradiating a positive ion beam on the surface of the specimen where the focused charged particle beam is irradiated and inducing a conductive layer on the surface of the specimen by the irradiation of the positive ion beam and diffusing an electric charge on the surface of the conductive layer.
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申请公布号 |
US6303932(B1) |
申请公布日期 |
2001.10.16 |
申请号 |
US19980195711 |
申请日期 |
1998.11.19 |
申请人 |
HITACHI, LTD. |
发明人 |
HAMAMURA YUICHI;SHIMASE AKIRA;AZUMA JUNZOU;MIZUMURA MICHINOBU;NISHIMURA NORIMASA;KOIZUMI YASUHIRO;KOIKE HIDEMI |
分类号 |
H01J37/20;H01J37/28;(IPC1-7):H01J37/244 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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