发明名称 Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam
摘要 A secondary charged particle image acquisition method and its apparatus for detecting a secondary charged particle image. The method includes the steps of irradiating a surface of a specimen with a focused charged particle beam and detecting a secondary charged particle emanated from the surface of the specimen, obtaining a secondary charged particle image based on the detected secondary charged particle, irradiating a positive ion beam on the surface of the specimen where the focused charged particle beam is irradiated and inducing a conductive layer on the surface of the specimen by the irradiation of the positive ion beam and diffusing an electric charge on the surface of the conductive layer.
申请公布号 US6303932(B1) 申请公布日期 2001.10.16
申请号 US19980195711 申请日期 1998.11.19
申请人 HITACHI, LTD. 发明人 HAMAMURA YUICHI;SHIMASE AKIRA;AZUMA JUNZOU;MIZUMURA MICHINOBU;NISHIMURA NORIMASA;KOIZUMI YASUHIRO;KOIKE HIDEMI
分类号 H01J37/20;H01J37/28;(IPC1-7):H01J37/244 主分类号 H01J37/20
代理机构 代理人
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