| 摘要 |
A surface of a vapor-phase deposited, synthetic thin diamond film is polished by:preparing a polishing liquid of silicon dioxide powder particles having an average particle size within the range of from 5 to 1,000 nm dispersed and distributed in an aqueous solution in an amount of from 5 to 40 wt. %, the dispersion having a coefficient of viscosity of from 1 to 200 cP and a pH of from 8 to 12.5, applying the polishing liquid to a surface of a vapor-phase synthetic thin diamond film and bringing a flat surface of a stool composed of a soft artificial or natural organic material into contact with the surface; and repetitively applying a mutual planar movement under pressure between the surface of said stool and the surface of the thin diamond film.
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