发明名称 ELECTRON OPTICAL SYSTEM ARRAY, CHARGED PARTICLE BEAM EXPOSURE DEVICE USING IT AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron optical system array wherein various kinds of conditions such as miniaturization, high precision, and reliability are achieved in high levels. SOLUTION: Each has a first electrode and a second electrode having a membrane provided with a plurality of openings and a substrate supporting the membrane, and also has a spacer for retaining a space between both membranes of the first electrode and the second electrode. The spacer is supported on the membrane. For example, the spacer has an insulating body, and is arranged in a position avoiding the opening.
申请公布号 JP2001283756(A) 申请公布日期 2001.10.12
申请号 JP20000097127 申请日期 2000.03.31
申请人 CANON INC 发明人 YAGI TAKAYUKI;SHIMADA YASUHIRO;ONO HARUTO
分类号 G03F7/20;G21K1/087;H01J37/04;H01J37/12;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/04 主分类号 G03F7/20
代理机构 代理人
主权项
地址