发明名称 |
SEMICONDUCTOR DEVICE OF NITRIDE GROUP III-V COMPOUND AND METHOD OF MANUFACTURING THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device of nitride group III-V compound and a method for manufacturing the device, which can reduce crystalline defects in a nitride group III-V compound semiconductor growth layer to improve characteristics. SOLUTION: An active region 6 is provided on a lateral growth layer 5 grown in a C-axis direction of a semiconductor device of nitride group III-V compound laminated by the nitride group III-V compound on a surface parallel to a C axis. |
申请公布号 |
JP2001284263(A) |
申请公布日期 |
2001.10.12 |
申请号 |
JP20000094994 |
申请日期 |
2000.03.30 |
申请人 |
FUJITSU LTD |
发明人 |
HORINO KAZUHIKO;KURAMATA AKITO |
分类号 |
H01L21/205;H01L33/12;H01L33/16;H01L33/32;H01L33/34;H01L33/40;H01S5/323;H01S5/343 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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