发明名称 SEMICONDUCTOR DEVICE OF NITRIDE GROUP III-V COMPOUND AND METHOD OF MANUFACTURING THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device of nitride group III-V compound and a method for manufacturing the device, which can reduce crystalline defects in a nitride group III-V compound semiconductor growth layer to improve characteristics. SOLUTION: An active region 6 is provided on a lateral growth layer 5 grown in a C-axis direction of a semiconductor device of nitride group III-V compound laminated by the nitride group III-V compound on a surface parallel to a C axis.
申请公布号 JP2001284263(A) 申请公布日期 2001.10.12
申请号 JP20000094994 申请日期 2000.03.30
申请人 FUJITSU LTD 发明人 HORINO KAZUHIKO;KURAMATA AKITO
分类号 H01L21/205;H01L33/12;H01L33/16;H01L33/32;H01L33/34;H01L33/40;H01S5/323;H01S5/343 主分类号 H01L21/205
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