| 摘要 |
PROBLEM TO BE SOLVED: To improve the control accuracy of a charged particle beam exposure system when variations exist in exposing using a charged particle beam by well adjusting the exposure and the continuous moving amount of the stage. SOLUTION: This exposure system is provided with a charged particle beam generating section 1 which exposes an object by projecting the charged particle beam, the stage 16 which can continuously move while the object is placed on the stage 16, and a driving section 17 which continuously moves the stage 16. This system is also provided with a control section 20 which controls the projection of the beam and the continuous movement of the stage 16. The control section 20 is provided with a deflection control circuit 23 which calculates the deflected amount of the beam by finding the difference between the present position of the stage 16 and the spotted position of the beam, and a stage control circuit 25. The circuit 25 is provided with a deviation computing section 26 which computes the deviation between the deflected amount of the beam and the target in a deflection area in the continuously moving direction of the stage 16, and a speed compensation control section 27 which accelerates or decelerates the continuous moving speed of the stage 16 in the direction in which the deviation computed by the section 26 becomes zero.
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