PHOTORESIST COATER, DEVELOPER AND STRIPPER AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To solve the problem on a photoresist coater and a method for processing a semiconductor substrate employing it that the surface of the semiconductor substrate is exposed by stripping liquid and roughened when photoresist is stripped because the semiconductor substrate is coated directly with photoresist. SOLUTION: A photoresist coater comprising means for supporting substrates rotatably sheet by sheet, a drive means for turning the supporting means, and means for supplying photoresist onto the substrate is further provided with means for supplying ozone water onto the substrate.