EXPOSURE SYSTEM, METHOD OF MANUFACTURING DEVICE, MAINTENANCE METHOD FOR SEMICONDUCTOR MANUFACTURING PLANT AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To efficiently manufacture a high-resolution semiconductor device by using exposing light having a short wavelength. SOLUTION: An exposure system is provided with an enclosure which contains at least part of an exposing optical axis and is hermetically sealed in a prescribed atmosphere and a detecting system having an optical system. Part of the detecting system is positioned in a first space surrounded by the enclosure and the other part is positioned in a second space provided outside the enclosure.