| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem in which a coated film is deteriorated in solubility due to various factors and often gets hard to remove in a case in which the coated film for protecting a pattern forming material is removed by dissolution when the pattern forming material is developed. SOLUTION: Trehalose or its derivative is added to coating material, by which a coating material film is restrained from being modified. In this pattern forming method, a coated film that containing trehalose or its derivative to be removable by dissolution is used for a pattern forming process. |
