发明名称 PROJECTION OPTICAL SYSTEM AND PROJECTION EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To form an isolated pattern such as a contact hole in high resolution with an enough depth of focus. SOLUTION: The center of a phase distribution generating member 3 may be shielded from light rays, and the radius of a shaded circular part 10 is set half as large as that of the whole light transmission region. It is found by a point image distribution function I (r, z) obtained through the phase distribution generating member 3 that an image around a dark center is more improved in defocus characteristics than a case in which the center is not shielded from light rays. The phase distribution generating member 3 is manufactured through a manner in which a member is divided into regions in a radial direction, and it is changed in thickness distribution like a spiral staircase. By this setup, a manufacturing method in which a lithography technique widely used for manufacturing a binary optical device is applied can be used, by which a device of very accurate shape can be manufactured.
申请公布号 JP2001284221(A) 申请公布日期 2001.10.12
申请号 JP20000094953 申请日期 2000.03.30
申请人 CANON INC 发明人 UNNO YASUYUKI
分类号 G03F7/207;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/207
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