发明名称 CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam exposure system not required to be installed in a magnetically shielded room, less affected by a magnetic field produced by a linear motor, and high in accuracy. SOLUTION: An illuminating lens system 1, a projection lens system 2, a reticle chamber 3, and a wafer chamber 4 are made of thick ferromagnetic material respectively, so that an external magnetic field hardly penetrates into an electron beam lens tube. Partitioning plates 11, 12, 13, and 14 have each a structure in which three ferromagnetic plates are laminated together, interposing a non-magnetic material between them, and they are each fixed on the inner upper and inner under surfaces of the reticle chamber 3 and the wafer chamber 4. By this setup, a partition is formed between the reticle chamber 3 in which a linear motor is provided, the wafer chamber 4 and the electron beam lens tube, so that a magnetic field from a linear motor can be blocked.
申请公布号 JP2001284239(A) 申请公布日期 2001.10.12
申请号 JP20000100241 申请日期 2000.04.03
申请人 NIKON CORP 发明人 NAKASUJI MAMORU
分类号 G03F7/20;G21K5/10;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址