发明名称 SYSTEM AND METHOD FOR X-RAY EXPOSURE
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray exposure system which can obtain a desired stripe image on an exposure surface. SOLUTION: In the optical path through which X-rays radiated from an X-ray source reach the X-ray mask, a filter having an absorption coefficient which varies depending upon photon energy is set up. When the mask pattern of the X-ray mask contains a plurality of X-ray blocking areas arranged in parallel at regular intervals and X-ray transmitting areas demarcated between adjacent X-ray blocking areas,|PS-PT|(where, PS and PT respectively represent the intensities of the X-rays on the exposed surface corresponding to the center of the X-ray transmitting areas and the exposed surface corresponding to the center of the X-ray intercepting areas) becomes larger when the filter is set up than the case where the filter is removed.</p>
申请公布号 JP2001284220(A) 申请公布日期 2001.10.12
申请号 JP20000094634 申请日期 2000.03.30
申请人 SUMITOMO HEAVY IND LTD 发明人 TOYODA EIJIRO
分类号 G03F1/22;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/22
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