| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide the manufacturing method of a semiconductor device, which can form work shapes different in the respective parts of a chip with satisfactory controllability, can sufficiently perform work with satisfactory controllability, even if a film where bases partially differ exists in the chip and can form a precise pattern, and to provide the semiconductor device obtained by the method. SOLUTION: The mask of resist 18 of the film, including carbon, is worked after a hard mask (15) is worked. Thus, a prescribed part sets the hard masks, in a state where they are incorporated in resist, another part of the prescribed part forms a part where the resist mask exists and the other part forms a part where the hard mask exists. Thus, the work shape different in the respective parts of the chip can be formed with satisfactory controllability, and work can be performed with sufficient controllability, even if the film where the bases partially differ exists in the chip.</p> |
