发明名称 CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus such as an electron beam drawing apparatus or the like enabling improvement of a current density, and retaining uniformity of charged particle beams at the same time. SOLUTION: By forming a Wehnelt electrode 23 of an electron gun into a conical shape, electron beams radiating from a tip 25 in multiple directions are converged in one direction. An electrode angle of the conical shape is set to 150 to 160 degrees. Thereby, beam current is improved and improvement of picture drawing throughput can be achieved.
申请公布号 JP2001283758(A) 申请公布日期 2001.10.12
申请号 JP20000092979 申请日期 2000.03.28
申请人 HITACHI LTD 发明人 SOMETA YASUHIRO;TANIMOTO AKIYOSHI;OTA HIROYA;HAYATA YASUNARI
分类号 G03F7/20;H01J37/06;H01J37/063;H01J37/305;H01L21/027;(IPC1-7):H01J37/06 主分类号 G03F7/20
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