| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer lifting apparatus that can keep a sufficient clean environment and can reduce the adhesion of particles to the wafer in the wafer lifting apparatus for supplying the wafer in an apparatus installed in an enclosure that keeps the clean environment. SOLUTION: A blast means 14 by which a clean air in the enclosure 20 adjacent to the wafer lifting apparatus 10 can be taken and the clean air is permitted to flow into the whole inside of the wafer lifting apparatus 10 is provided. |
