STORAGE CABINET, EXPOSURE SYSTEM, METHOD OF MANUFACTURING DEVICE, AND MAINTENANCE METHOD FOR SEMICONDUCTOR MANUFACTURING PLANT AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a storage cabinet which stores a reticle or a wafer in an atmosphere in which oxygen concentration is lowered to about 5 ppm in a stage before the reticle or the wafer is transported to an exposure system and delivers the reticle or the wafer to the exposure system without exposing them to the outside air. SOLUTION: This storage cabinet has a first encapsulating body, an atmosphere control means which controls the atmosphere in the encapsulating body to a first atmosphere, and a transporting means which delivers or receives a stored object to or from the exposure system without exposing the object to the outside atmosphere of the encapsulating body and stores at least one object in the encapsulating body.