| 发明名称 |
MANUFACTURING METHOD OF FINE STRUCTURE |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning means which has precision of micron order and forms a good functional thin film in a simple process. SOLUTION: A lyophilic part and a liquid-repellant part are formed in a prescribed pattern by using an organic film (14) on a substrate surface, and a functional thin film (13) is formed selectively in a lyophilic part on the substrate by a spin coating method. |
| 申请公布号 |
JP2001284289(A) |
申请公布日期 |
2001.10.12 |
| 申请号 |
JP20000098158 |
申请日期 |
2000.03.31 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
ISHIDA MASAYA;FURUSAWA MASAHIRO |
| 分类号 |
G03F7/38;B05D1/40;B05D7/04;H01L21/28;H01L21/288;H01L21/316;H01L21/3205;H01L29/06;(IPC1-7):H01L21/288;H01L21/320 |
主分类号 |
G03F7/38 |
| 代理机构 |
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代理人 |
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| 主权项 |
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