发明名称 Substrate processeing apparatus, substrate processing method and electronic device manufacturing method
摘要 A substrate processing apparatus includes a process be for forming a processing chamber provided at its lower end with a furnace port, a boat for going in and out from the processing chamber to transfer a substrate or substrates into and out from the processing chamber, a chamber forming a eliminary chamber and disposed below the processing tube for staying the boat on standby, a seal flange disposed between the processing chamber and the preliminary chamber and having opening through which the boat passes, and a seal lid detachably disposed on the seal flange at the side of the processing chamber for seating on the seal flange to air-tightly close the opening.
申请公布号 US2001029108(A1) 申请公布日期 2001.10.11
申请号 US20010799816 申请日期 2001.03.05
申请人 TOMETSUKA KOUJI 发明人 TOMETSUKA KOUJI
分类号 C23C16/44;C30B25/08;C30B31/10;H01L21/205;H01L21/22;H01L21/677;(IPC1-7):H01L21/31 主分类号 C23C16/44
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