发明名称 |
Monolithic nozzle assembly formed with mono-crystalline silicon wafer and method for manufacturing the same |
摘要 |
A monolithic nozzle assembly for fluid, and a method for manufacturing the same with a single mono-crystalline silicon wafer by continuous self-alignment are provided. The monolithic nozzle assembly can be formed with a single (100) monocrystalline silicon wafer. Compared with a complicated nozzle assembly formed using a great number of silicon wafers and plates, the configuration of the monolithic nozzle assembly is simple, and can be manufactured on a mass production scale by semiconductor manufacturing processes. The monolithic nozzle assembly can be manufactured by continuous self-alignment, including anisotropic etching using the characteristic of the crystal plane of silicon, and LOCOS-based masking. Compared with a common photolithography process, the alignment error may be reduced below a few microns. The overall manufacturing process is simple and efficient with a high yield.
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申请公布号 |
US2001028378(A1) |
申请公布日期 |
2001.10.11 |
申请号 |
US20010790714 |
申请日期 |
2001.02.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE EUN-SUNG;KIM HYUN-CHEOL;OH YONG-SOO;SONG CIMOO |
分类号 |
B41J2/135;B41J2/14;B41J2/16;B81B1/00;B81C1/00;(IPC1-7):B41J2/05 |
主分类号 |
B41J2/135 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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