发明名称 Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device
摘要 There is disclosed a technique in which stripe formation due to laser annealing is prevented and uniform laser annealing is made over the whole surface of a substrate. A laser beam having an energy distribution with an edge which has a nearly vertical shape is used, and when scanning of the laser beam is carried out, the scanning is carried out while the edge having the nearly vertical shape is made the front of the scanning.
申请公布号 US2001029089(A1) 申请公布日期 2001.10.11
申请号 US20010843714 申请日期 2001.04.30
申请人 TANAKA KOICHIRO 发明人 TANAKA KOICHIRO
分类号 H01S5/30;B23K26/06;B23K26/073;G02B27/09;(IPC1-7):H01L21/324 主分类号 H01S5/30
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