发明名称 |
Heat treatment apparatus |
摘要 |
A substrate heat treatment apparatus irradiating a substrate such as a semiconductor wafer with light and performing heat treatment is provided. 19 lamps 82 are arranged on a plane in the form of a honeycomb to form a lamp group 81. The lamp group 81 has 6-fold rotation symmetry about a symmetry axis XR. A substrate W is rotated about a rotation axis XW in a plane parallel to that formed by the lamp group 81. The symmetry axis XR of the lamp group 81 and the rotation axis XW of the substrate W are displaced for relaxing peaks and bottoms of illuminance distribution on the substrate W resulting from regularity of arrangement of the lamp group 81. Consequently, fluctuation of radial illuminance distribution on the substrate W is reduced and improving uniformity is improved. When the uniformity of radial illuminance distribution on the substrate W is improved, temperature uniformity of the substrate W in heat treatment can be ensured.
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申请公布号 |
US2001027969(A1) |
申请公布日期 |
2001.10.11 |
申请号 |
US20010788086 |
申请日期 |
2001.02.16 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
TAKAHASHI MITSUKAZU;NISHIHARA HIDEO;ITO YOSHIO |
分类号 |
H01L21/31;H01L21/00;H01L21/26;H05B3/00;(IPC1-7):F27D11/00;A21B2/00 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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