| 摘要 |
<p>A method of adjusting plasma processing of a substrate in a plasma reactor. The method includes positioning the substrate in the reactor, creating a plasma in the reactor, monitoring optical emissions emanating from different regions of the plasma in a direction substantially parallel to the substrate surface during plasma processing, and determining an integrated power spectrum for each of the different plasma regions and comparing each of the integrated power spectra to a predetermined value. The method also includes utilizing an electrode assembly having a plurality of electrode segments based on differences in the integrated power spectra from the predetermined value. Another aspect of the invention includes altering the flow of gas to different regions of the plasma in response to differences in the integrated power spectra detected by the fiber optic sensors.</p> |
