发明名称 |
Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device |
摘要 |
An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.
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申请公布号 |
US2001028042(A1) |
申请公布日期 |
2001.10.11 |
申请号 |
US20010824874 |
申请日期 |
2001.04.04 |
申请人 |
HAMAGUCHI SHINICHI;HARAGUCHI TAKESHI;YASUDA HIROSHI |
发明人 |
HAMAGUCHI SHINICHI;HARAGUCHI TAKESHI;YASUDA HIROSHI |
分类号 |
H01J37/317;(IPC1-7):A61N5/00;G21G5/00 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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