Multi-beam exposure apparatus using a muti-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device

摘要

An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings and a plurality of dummy openings. The lens openings allow the electron beams to pass therethrough, respectively, so as to converge the electron beams independently of each other. The dummy openings allow no electron beam to pass therethrough.