发明名称 COATING COMPOSITION FOR THE PRODUCTION OF INSULATING THIN FILMS
摘要 <p>A coating composition for the production of insulating thin films which comprises (A) a silica precursor containing at least one member selected from the group consisting of alkoxysilanes and hydrolyzates thereof, (B) at least one organic polymer, (C) water, (D) at least one alcohol, and, if necessary, (E) an organic solvent for a mixture of the components (A), (B), (C) and (D), characterized in that the water/precursor (C/A) weight ratio (WR) satisfies the relationship: 0.01 < WR < 10, that the weight of water (C) is greater than that of the alcohol (D), and that when the polymer (B) is insoluble in a mixture of water (C) with the alcohol (D), the composition comprises all of the components (A) to (E).</p>
申请公布号 WO0174957(A1) 申请公布日期 2001.10.11
申请号 WO2001JP02932 申请日期 2001.04.04
申请人 ASAHI KASEI KABUSHIKI KAISHA;HANAHATA, HIROYUKI;ARAKI, TORU;NAKAMURA, MIKIHIKO 发明人 HANAHATA, HIROYUKI;ARAKI, TORU;NAKAMURA, MIKIHIKO
分类号 C09D5/25;C09D183/04;C09D183/14;H01L21/312;H01L21/316;(IPC1-7):C09D183/02;C01B33/12;H01L21/76 主分类号 C09D5/25
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