Process for coating and/or treating a surface of a substrate used in the production of semiconductor elements such as thin layer solar cells comprises bombarding the surface

摘要

Process for coating and/or treating a surface (32) of a substrate (30) comprises bombarding the surface with a gas containing particles which form layers. The gas is divided into partial streams which are adjusted with respect to their particle concentration and/or dwell time on the surface and/or directly in the area of the surface of the substrate so that the same amount of particles are deposited and/or react per surface unit per time unit. An independent claim is also included for an apparatus for carrying out the coating and/or treating process. Preferred Features: The dwell time is adjusted by relative movement between the surface and the sources (76). The sources are directed onto the surface. The partial streams vertically hit the surface and are released via several sources onto the surfaces, between which sinks (62) for the gas used to bombard the surface are located.