| 摘要 |
A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), <CHEM> wherein A<1> and A<2> are an acid-dissociable monovalent organic group, R<1> is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R<2> is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc. |
