| 摘要 |
<p>The invention relates to a device, simple in construction, adapted to produce high density plasma. The device comprises a process chamber (3) in which a target (54) is mounted and at least one source chamber (2) which further comprises a RF helical coil antenna (10). Plasma is formed by the ionisation of gas within the chamber under a vacuum, such that plasma formed in the source chamber may be focused mounted within a source chamber induces the formation of a high density plasma which is focused and directed towards a target by magnetic means (12, 13, 56, 57). <IMAGE></p> |
