| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter substrate by which the adhesion property of a transparent electrode to a protective film is improved, difference in etching of a transparent conductive film formed on the protective film and on the substrate can be decreased, failure in alignment in an alignment film can be prevented and scratching resistance of the transparent electrode can be improved. SOLUTION: After a color filter layer 15 and a protective film 16 are formed on a substrate body 11A, the substrate is subjected to plasma ashing to remove the residue of a resist on the substrate body 11A. Then a first transparent conductive film 18A is formed on the substrate body 11A by a sputtering method with low power, and a second transparent conductive film 18B is formed on the first transparent conductive film 18A by an ion plating method. Finally, the first transparent conductive film 18A and the second transparent conductive film 18B are processed into a specified pattern to obtain a transparent electrode 18. |
