| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymeric compound for a resist having a superior film forming property as well as keeping resist characteristics such as an alkali- solubility and an adhesiveness to substrate. SOLUTION: The polymeric compound for a resist comprises a repetition unit having an acid-eliminating group, a repetition unit having an adhesion group to substrate, and a repetition unit expressed by formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 represents a 3-8C alkyl group (provided that a tertiary alkyl group is excluded). The repetition unit expressed by formula (1) is about 0.01-30 mol % of all the repetition units composing a polymer. |
