Apparatus and method for controlling the temperature of a wall of a reaction chamber

摘要

An apparatus and a concomitant method for controlling coolant (air) flow proximate a reaction chamber (102) within a workpiece processing system (100) such that the temperature of a wall of the reaction chamber (102) is maintained at a predefined target temperature. The target temperature is typically a temperature that optimizes a process concurrently being accomplished within the chamber (102), e.g., utilizing one temperature during deposition processes and a different temperature during cleaning processes. The apparatus contains a temperature measuring device (140) to measure the temperature of the chamber wall. The measured temperature is compared to the predefined target temperature. A closed loop system controls the air flow proximate the chamber walls such that the measured temperature becomes substantially equal to the target temperature. Air flow control is provided by an air flow control device (138) located within an inlet conduit (120) that supplies air to a shroud for channeling the air past the reaction chamber (102). The shroud forms a portion of a housing (118) which supports and encloses the reaction chamber (102).