发明名称 |
INSPECTING METHOD, MASK MANUFACTURING METHOD AND INSPECTING DEVICE, AND MASK |
摘要 |
<p>PROBLEM TO BE SOLVED: To correct erroneous inspection due to differences among individual masks in the mask inspection. SOLUTION: Apart from a main pattern, a pattern for correction is provided on a mask. Signal correction and focus correction are performed, based on a signal for correction obtained by photographing the pattern for correction.</p> |
申请公布号 |
JP2001281159(A) |
申请公布日期 |
2001.10.10 |
申请号 |
JP20000094561 |
申请日期 |
2000.03.30 |
申请人 |
TOSHIBA CORP |
发明人 |
OKUDA KENTARO |
分类号 |
G01N21/956;G03F1/84;H01L21/027;H01L21/66;(IPC1-7):G01N21/956;G03F1/08 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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