| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce defect rate, when a resin layer is formed to manufacture an active matrix substrate with the resin layer. SOLUTION: A method for manufacturing the active matrix substrate with the resin layer, having a stage for forming the photosensitive resin layer on the active matrix substrate, a stage for pattern-exposing the photosensitive resin layer and a stage for developing the photosensitive resin layer to form a contact part in the resin layer is characterized, in that the optical density (OD in formula 1) of the photosensitive resin layer is 0.5-4 and the distance between an exposure mask and the photosensitive resin layer at pattern exposure is 16-300μm.</p> |
